CVD Equipment - Company Ranking(22 companies in total)
Last Updated： Aggregation Period:Feb 18, 2026〜Mar 17, 2026
This ranking is based on the number of page views on our site.
Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| 【Specifications (Partial)】 ■Size: 890mm(W) × 2300mm(D) × 2250mm(H) ■Film Thickness Uniformity: ≦±2% (in-plane, between planes) ■Temperature:... | For more details, please refer to the PDF document or feel free to contact us. | ||
| 【Specifications】 ○Size: 1460mm(W) × 3830mm(D) × 2250mm(H) ○Film deposition rate: Up to 5000Å/min ○Particles: Increase of 15 or fewer with a ... | For more details, please contact us or download the catalog. | ||
| 【Specifications (Partial)】 ■Size: W1500mm × D2850mm × H2000mm ■Film deposition speed: Up to 350nm/min ■Temperature: Up to 450℃ ■Wafer size: ... | For more details, please refer to the PDF document or feel free to contact us. | ||
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天谷製作所
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- Featured Products
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Single-wafer atmospheric pressure CVD device 'A200V'
- overview
- 【Specifications (Partial)】 ■Size: 890mm(W) × 2300mm(D) × 2250mm(H) ■Film Thickness Uniformity: ≦±2% (in-plane, between planes) ■Temperature:...
- Application/Performance example
- For more details, please refer to the PDF document or feel free to contact us.
Atmospheric Pressure CVD Equipment "AMAX800V"
- overview
- 【Specifications】 ○Size: 1460mm(W) × 3830mm(D) × 2250mm(H) ○Film deposition rate: Up to 5000Å/min ○Particles: Increase of 15 or fewer with a ...
- Application/Performance example
- For more details, please contact us or download the catalog.
Mass production continuous atmospheric pressure CVD equipment 'A6300S'
- overview
- 【Specifications (Partial)】 ■Size: W1500mm × D2850mm × H2000mm ■Film deposition speed: Up to 350nm/min ■Temperature: Up to 450℃ ■Wafer size: ...
- Application/Performance example
- For more details, please refer to the PDF document or feel free to contact us.
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天谷製作所
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